Nanoimprint lithography for nanodevice fabrication
نویسندگان
چکیده
منابع مشابه
Nanoimprint lithography for nanodevice fabrication
Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or even helium ion beam lithography. Furthermore, the use of mechanical deformation during the NIL p...
متن کاملFabrication of nanocontacts for molecular devices using nanoimprint lithography
We present a simple process to fabricate gold nanocontacts with a gap as small as sub-10 nm. This method uses a two-step process of nanoimprint lithography ~NIL! and electromigration. First, 20 nm wide gold nanowires were fabricated by NIL on a silicon dioxide substrate. Then by passing an electric current through a nanowire, the nanowire is split into two wires with a gap as small as sub-10 nm...
متن کاملFabrication of flexible mold for hybrid nanoimprint-soft lithography
0167-9317/$ see front matter 2011 Elsevier B.V. A doi:10.1016/j.mee.2010.12.107 ⇑ Corresponding author. E-mail address: [email protected] (J We fabricated molds consisting of features in rigid UV-cured resist on an elastic poly(dimethylsiloxane) (PDMS) support for hybrid nanoimprint-soft lithography. The molds were duplicated through coating and curing a UV-curable resist onto a pol...
متن کاملNanoimprint lithography
Nowadays, nanodevices like small fluidic channels, semiconductor lasers, nano contacts for solar cells, nano magnets or nano antennas for infrared detection (THz) are of great interest. The applications for these devices extend the fields of e.g. energy, computational or medical sciences. For example, by arranging nano dots consisting of a magnetic material, logical circuits can be designed whi...
متن کاملNanoimprint Lithography
The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...
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ژورنال
عنوان ژورنال: Nano Convergence
سال: 2016
ISSN: 2196-5404
DOI: 10.1186/s40580-016-0081-y